Single Crystal Substrates

Most of microelectronic and optoelectronic devices are based on application of single crystal substrates on which thin films and structures with special properties are created using methods of epitaxial groth, ion implantation etc.

Such structures have versatile applications including:

• light emitting structures;
• magnetooptic films;
• high temperature superconductors;
• optical waveguides;
• optical radiation receivers;
• acoustoelectronic devices;
• THz band generators/receivers;
• photolithographic systems;

ELAN produces variety of single crystal substrates for R & D and OEM applications:

Oxide crystals:   SiO₂, MgO, TiO₂, TeO₂, ZnO, SrTiO₃, LiNbO₃, LiTaO₃

AII–BVI and AIII–BV crystals:   ZnS, ZnSe, ZnTe, CdTe, CdS, GaP, GaAs

Garnet Crystals:  GGG, YAG, GSGG

Substrates are produced according to customer’s specifications with sizes from 5 x 5 mm to 100 x 100 mm and thickness from 0.05 to 5 mm (max. and min. size depend on material type).

The following parameters are provided:
Surface quality – up to 10/5 S/D
Surface roughness – 5 – 15 A (depending on material)
Parallelism < 2”
Thickness tolerance – up to 0.5 mm
Orientation tolerance – up to 1 arc.min.